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Yuyu Bu, Jin-Ping Ao. A review on photoelectrochemical cathodic protection semiconductor thin films for metals. Green Energy&Environment, 2017, 2(4): 331-362. doi: 10.1016/j.gee.2017.02.003
Citation: Yuyu Bu, Jin-Ping Ao. A review on photoelectrochemical cathodic protection semiconductor thin films for metals. Green Energy&Environment, 2017, 2(4): 331-362. doi: 10.1016/j.gee.2017.02.003
shu

A review on photoelectrochemical cathodic protection semiconductor thin films for metals

doi: 10.1016/j.gee.2017.02.003

  • Institute of Technology and Science, Tokushima University, 2-1 Minami-Josanjima, Tokushima 770-8506, Japan

More Information
  • Corresponding author: E-mail address: jpao@ee.tokushima-u.ac.jp (Jin-Ping Ao)
  • Received date 26 December 2016, Accepted date 08 February 2017, RevRecd date 08 February 2017, Available online 15 February 2017, Publish date 31 October 2017,
    Abstract
  • Photoelectrochemical (PEC) cathodic protection is considered as an environment friendly method for metals anticorrosion. In this technology, a n-type semiconductor photoanode provides the photogenerated electrons for metal to achieve cathodic protection. Comparing with traditional PEC photoanode for water splitting, it requires the photoanode providing a suitable cathodic potential for the metal, instead of pursuit ultimate photon to electric conversion efficiency, thus it is a more possible PEC technology for engineering application. To date, great efforts have been devoted to developing novel n-type semiconductors and advanced modification method to improve the performance on PEC cathodic protection metals. Herein, recent progresses in this field are summarized. We highlight the fabrication process of PEC cathodic protection thin film, various nanostructure controlling, doping, compositing methods and their operation mechanism. Finally, the current challenges and future potential works on improving the PEC cathodic protection performance are discussed.

     

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